Ion Sputter Coaters

For Non-Conductive samples, the use of a Sputter Coater to apply a nano-thin layer of conductive metal allows imaging at the highest resolution and magnifications without concern of electron charge effects.

Non-conductive samples require a nano-thin coating to prevent electron charging and improved imaging. While non-conductive samples can be imaged in Low Vacuum mode, a sputter coater is an invaluable tool for electron microscopy to achieve the highest magnifications and best quality images. These ion Sputter Coaters are designed for super simple operation and low cost.

Two Sputter Coater models are available for quickly applying a ultra-thin coating of conductive material to non-conductive samples to prevent charging while under e-Beam imaging.  These coaters are very simple to use and can greatly improve imaging resolution and sharpness. For EDS analysis, carbon coaters are commonly used.  Please contact us for discussion on sourcing a Carbon Coater for EDS as there may be other solutions for your sample types prior to investing in a dedicated carbon coater.


Our basic coater, the MCM-100 is fully self-contained requiring only electrical power.  The vacuum pump is built into the system internally making this unique coater the most economical and space saving solution for sputter coating.  The MCM-100 is the perfect coater for basic sample conductivity preparation.

  • Fast and Easy Coating: Press Start -> Automatic Vacuum -> Plasma Coating -> Vent
  • Coating Time is user settable and displayed
  • Coating Current is user settable and displayed
  • Minimal Installation Space necessary with self-contained vacuum pump


This coater integrates an LCD touch-screen user interface for operation.  The external vacuum pump allows faster and higher vacuum to be achieved as compared to the MCM-100 with a higher vacuum often resulting in a slightly smaller coated grain size.

  • LCD control Panel – save multiple settings and coating recipes
  • Fast and Easy Coating: Press Start -> Automatic Vacuum -> Plasma Coating -> Vent
  • Coating Time is user settable and displayed on LCD
  • Minimal Installation Space for coater
  • External Rotary Vane Vacuum Pump included


MCM-100 MCM-200
Target Materials Au, Pt Au, Pt
Target Size Φ50mm Φ50mm
Chamber Size Φ120mm x 65mm Φ130mm x 110mm
Max Sample Size Φ50mm Φ50mm
Target to Sample Distance 35mm 35mm
Dimensions (mm) 180(W) x 310(D) x 310(H) 308(W) x 285(D) x 256(H)
Weight 15kg 10kg (without pump)