Semiconductors

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Semiconductors

Wafer inspection, defect analysis, process development, and quality control

The microelectronic devices we enjoy and depend on today would not be possible without electron microscopy. From R&D to production QC, scanning electron microscopy provides the resolution and analytical capabilities essential for semiconductor manufacturing and failure analysis.

The SNE-Alpha desktop SEM delivers the imaging performance needed for semiconductor applications in a compact, accessible format. With 5nm resolution, 1-30kV accelerating voltage range, and optional EDS integration, you can characterize devices with both high-resolution morphological imaging and elemental analysis.

Key Semiconductor Applications

  • Wafer Inspection: Examine surface defects, contamination, and process variations across wafer surfaces
  • Defect Analysis: Identify and characterize crystallographic defects, particles, and foreign materials
  • Cross-Section Analysis: Measure layer thicknesses, via profiles, and interface quality
  • Failure Analysis: Investigate device failures, electrical shorts, and manufacturing defects
  • Process Development: Optimize etch profiles, deposition uniformity, and lithography patterns
  • Particle Identification: Combine SEM imaging with EDS to identify contamination sources

Why Desktop SEM for Semiconductors?

While many semiconductor fabs rely on large floor-model SEMs, a desktop SEM like the SNE-Alpha offers significant advantages for certain applications:

  • Fast Turnaround: 90-second pump-down means quick sample inspection without waiting for central lab availability
  • Point-of-Use: Locate the SEM near your cleanroom or process line for immediate feedback
  • R&D Flexibility: Ideal for university research, startups, and development labs
  • Cost Effective: Lower capital and operating costs than floor-model alternatives

Recommended Analytical Techniques

SE Imaging

High-resolution topographic imaging for surface features, patterns, and structures.

BSE Imaging

Compositional contrast to distinguish materials and detect buried features.

EDS Analysis

Elemental identification of particles, contamination, and layer composition.

EBIC

Electron beam induced current for junction visualization and defect localization.

Recommended Equipment

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